MAT SCI SEMICON PROC
ISSN:1369-8001 E-ISSN:— 出版商:Elsevier 国家:ENGLAND 周期:Bimonthly来源El
| 收录情况 | h-index:49 CiteScore:5.90 |
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing| applications and theoretical studies of functional materials and devices for (opto)electronics| sensors| detectors| biotechnology and green energy. Each issue will aim to provide a snapshot of current insights| new achievements| breakthroughs and future trends in such diverse fields as microelectronics| energy conversion and storage| communications| biotechnology| (photo)catalysis| nano- and thin-film technology| hybrid and composite materials| chemical processing| vapor-phase deposition| device fabrication| and modelling| which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers| oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics| ab-initio methods| Monte Carlo| etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability| defect density| intrinsic impurities and defects.
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