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Recent Patents on Nanotechnology

RECENT PAT NANOTECH

ISSN:1872-2105 E-ISSN:2212-4020  出版商:Bentham Science Publishers B.V  国家:U ARAB EMIRATES

影响因子(2024)
3.100
中科院分区(2025 官方末版)
4 区
JCR 分区
Q2
审稿周期
约13 周
录用比例
暂无
收录情况  h-index:24  CiteScore:2.10
投稿入口: 投稿系统  期刊官网 

期刊简介

Recent Patents on Nanotechnology publishes full-length/mini reviews and research articles that reflect or deal with studies in relation to a patent| application of reported patents in a study| discussion of comparison of results regarding application of a given patent| etc.| and also guest edited thematic issues on recent patents in the field of nanotechnology. A selection of important and recent patents on nanotechnology is also included in the journal. The journal is essential reading for all researchers involved in nanotechnology.

投稿经验(0 条,)

georgegrace  2012-10-03 14:36:00.0
2011年刚进入SCI,主要收录纳米技术专利的综述类文章,想写综述练笔的不妨一试。2012年影响因子1.275。

数据整理自公开网络的投稿反馈,仅供参考。