VACUUM

Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed| with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers| thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation| vacuum measurement| vacuum gas dynamics| gas-surface interactions| surface treatment for UHV applications and low outgassing| vacuum melting| sintering| and vacuum metrology. Technology and solutions for large-scale facilities (e.g.| particle accelerators and fusion devices). New instrumentation ( e.g.| detectors and electron microscopes). 2. Plasma science; advances in PVD| CVD| plasma-assisted CVD| ion sources| deposition processes and analysis. 3. Surface science; surface engineering| surface chemistry| surface analysis| crystal growth| ion-surface interactions and etching| nanometer-scale processing| surface modification. 4. Materials science; novel functional or structural materials. Metals| ceramics| and polymers. Experiments| simulations| and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.

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